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Atomic layer deposition and characterization of thin oxide films for application in protective coatings
Author: Lauri Aarik, Tartu Ülikool. Füüsika instituut, Tartu Ülikool. Materjaliteaduse osakond, Tartu Ülikool. Loodus- ja täppisteaduste valdkond, Eesti-AGA (firma), Supervisor: Väino Sammelselg
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